等離子刻蝕技術(shù)在第三代化合物半導(dǎo)體領(lǐng)域的應(yīng)用Application of Plasma Etching Technology in the Third-generation Compound Semiconductor Field謝秋實(shí)北京北方華創(chuàng)微電子裝備有限公司 第一刻蝕事業(yè)部副總經(jīng)理XIE QiushiDeputy General Manager of NAURA Technology Group Co., Ltd.